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Workshop on Sequential Infiltration Synthesis (SIS)

We are pleased to propose the 1st Workshop on Sequential Infiltration Synthesis (SIS 2019) on October 16, 2019 in Milan (Italy) in conjunction with the 5th Directed Self-Assembly Symposium (DSA 2019) that will be held on October 16-18, 2019.


Scope

Sequential infiltration synthesis (SIS) provides a viable preparation route for hybrid inorganicñorganic materials, by penetration of gaseous metal precursors into polymer films, fibers, foams, or biomaterials. The incorporation of inorganic materials into organic matrices offers the possibility to enhance the functional properties of the final composite (i.e. mechanical strength, chemical etch resistance, optical properties, etc.). Typical SIS process consists of a controlled sequence of metal-organic precursor and coreactant vapor exposures of the organic samples in an atomic layer deposition (ALD) reactor.

In particular, infiltration in lithographically patterned polymeric thin films or in self-assembled or directed self-assembled (DSA) block copolymer (BCP) films allows the formation of inorganic nanostructures, once the polymer matrix is removed by a plasma or annealing step. Simply replicating the patterned polymer or BCP templates, metal oxide (Al2O3, TiO2, SiO2, or ZnO) and metal (W) nanoarchitectures have been directly fabricated, for applications as sub-20 nm enhanced lithographic masks or as active elements in advanced nanoscale electronic devices.

The intersection of different communities interested in SIS, originated either from research on atomic layer deposition (ALD) or on advanced lithography, evidences the need of an event to bring together and to contaminate the different approaches to this topic. The aim of this one-day workshop is to address this need gathering leading scientists and engineers from both academia and industry working on or interested in SIS to give an overview of current topics in the field.

This one-day workshop will focus on the challenges related to potential applications of SIS as well as on the fundamental mechanisms. It will offer an event dedicated to present, discuss, exchange knowledge, and getting informed about the most recent developments. It will provide an opportunity for meeting, exchanging ideas, and designing new paths for collaborative research.


Topics

Topics of interest for the workshop will include:

Conference Venue

CNR Congress Center in Milan has a main conference room with 150 seats and several small rooms. SIS workshop will take place in the main conference room. Poster sessions, coffee breaks and buffet will be organized in the adjacent rooms.


Organizing Committee

Gabriele Seguini, Elena Cianci, Michele Perego, Claudia Wiemer
CNR-IMM, Unit of Agrate Brianza, Italy


Confirmed Invited Speakers


Call for Papers

Submit your abstract before July 31, 2019.
Best abstracts will be selected for oral presentation. Posters will be displayed throughout the SIS workshop and a dedicated poster session will be held on October 16th afternoon in conjunction with DSA symposium reception. The abstracts should fit in one A4 page in portrait layout. Affiliation, address and email of the corresponding author should be included.

To submit your abstract, please send an email message to with subject line: "Abstract Submission"


Important Dates


Registration

Registration Cost: Registration will open on July. More information will come.

Contact

If you need more information about SIS2019 don't hesitate to contact us: