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Workshop on Sequential Infiltration Synthesis (SIS)

We are pleased to propose the 1st Workshop on Sequential Infiltration Synthesis (SIS 2019) on October 16, 2019 in Milan (Italy) in conjunction with the 5th Directed Self-Assembly Symposium (DSA 2019) that will be held on October 16-18, 2019.


Scope

Sequential infiltration synthesis (SIS) provides a viable preparation route for hybrid inorganicñorganic materials, by penetration of gaseous metal precursors into polymer films, fibers, foams, or biomaterials. The incorporation of inorganic materials into organic matrices offers the possibility to enhance the functional properties of the final composite (i.e. mechanical strength, chemical etch resistance, optical properties, etc.). Typical SIS process consists of a controlled sequence of metal-organic precursor and coreactant vapor exposures of the organic samples in an atomic layer deposition (ALD) reactor.

In particular, infiltration in lithographically patterned polymeric thin films or in self-assembled or directed self-assembled (DSA) block copolymer (BCP) films allows the formation of inorganic nanostructures, once the polymer matrix is removed by a plasma or annealing step. Simply replicating the patterned polymer or BCP templates, metal oxide (Al2O3, TiO2, SiO2, or ZnO) and metal (W) nanoarchitectures have been directly fabricated, for applications as sub-20 nm enhanced lithographic masks or as active elements in advanced nanoscale electronic devices.

The intersection of different communities interested in SIS, originated either from research on atomic layer deposition (ALD) or on advanced lithography, evidences the need of an event to bring together and to contaminate the different approaches to this topic. The aim of this one-day workshop is to address this need gathering leading scientists and engineers from both academia and industry working on or interested in SIS to give an overview of current topics in the field.

This one-day workshop will focus on the challenges related to potential applications of SIS as well as on the fundamental mechanisms. It will offer an event dedicated to present, discuss, exchange knowledge, and getting informed about the most recent developments. It will provide an opportunity for meeting, exchanging ideas, and designing new paths for collaborative research.


Topics

Topics of interest for the workshop will include:

Conference Venue

CNR Congress Center in Milan has a main conference room with 150 seats and several small rooms. SIS workshop will take place in the main conference room. Poster sessions, coffee breaks and buffet will be organized in the adjacent rooms. Getting to the CNR Congress Center (Milano).


Organizing Committee

Gabriele Seguini, Elena Cianci, Michele Perego, Claudia Wiemer
CNR-IMM, Unit of Agrate Brianza, Italy


Confirmed Invited Speakers


Contributed Talks


Schedule

Registration, from 9:30

Introduction 10:15 - 10:30

Session 1: 10:30 - 12:00, Sequential Infiltration Synthesis and Vapor Phase Infiltration Lunch 12:00 - 13:45

Session 2: 13:45 - 15:05, Sequential Infiltration Synthesis and Characterizations

Break 15:05 - 15:40

Session 3: 15:40 - 16:50, Sequential Infiltration Synthesis and Nanofabrication

Closing Remarks 16:50 - 17:00

DSA Welcome Party, from 17.30

Registration

Registration Cost: Online Registration is now closed. You can register on site during the conference at the reception desk. The reception desk will open on October 16, 2019, from 9:30.

Contact

If you need more information about SIS2019 don't hesitate to contact us: